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Tanner's latest release of L-Edit presents
the first of a new series of MEMS targeted features!
With L-Edit, MEMS designers can easily see overlapping polygons, curves,
and other geometries, removing any uncertainty in the design process.
Rendering and design redraw times are minimal.
L-Edit design rule checking can be set to flag your custom process tolerances,
as well as to flag for objects with too many vertices.
See your actual MEMS designs prior to the mask making process.
For designers using a 10X stepper process, the L-Edit postscript output
macro enables low cost transparency 10X-masks to be output for commercial
print houses.
L-Edit let's you read and write AutoCAD's DXF file format directly. L-Edit
also supports the industry standard GDSII format.
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