ARCHIVES

	[press] : MEMS-spezifische Anforderungen an Layout-Tools	04 Nov 2003
	Design-Rule Checking Angesichts immer weiter standardisierter MEMS-Prozesse und immer komplexer werdender Bausteine kommt Design-Rule Checking (DRC) zunehmend zum Einsatz, um Fehler schon vor dem Tape-out zu ermitteln. more...

	[press] : Layout Tool Issues for MEMS Designers	02 Oct 2003
	By Amish Desai, Tanner Research Layout tools for micro-electromechanical systems (MEMS) have often posed a challenge for the MEMS designer. Because of the interdisciplinary nature of MEMS development, various types of software programs that were not originally intended for MEMS purposes have been used as layout tools. more...

	[news] : Tanner Launches L-Edit V10.0	16 May 2003
	Offers hierarchical DRC for faster run time and error identification. more...

	[news] : AMIS I2T100 0.7 micron High Voltage (100V) Available Through MOSIS	16 May 2003
	MOSIS is pleased to announce availability of the AMIS I2T100 0.7 micron process. more...

	[news] : IBM 5HPE 0.35 micron BiCMOS/SiGe Available Through MOSIS	16 May 2003
	MOSIS is pleased to announce availability of the IBM 5HPE 0.35 micron BiCMOS/SiGe processes. more...

<< Previous 1 2 Next >>